Linear extended ArcJet-CVD - a new PECVD approach for continuous wide area coating under atmospheric pressure

被引：31

作者：

Hopfe, V

Rogler, D

Maeder, G

Dani, I

Landes, K

Theophile, E

Dzulko, M

Rohrer, C

Reichhold, C

机构：

[1] Fraunhofer Inst Mat & Beam Technol, D-01277 Dresden, Germany

[2] Univ Fed Armed Forces, Dept Elect Engn, D-85577 Neubiberg, Germany

[3] Regatron AG, CH-9400 Rorschach, Switzerland

[4] Berndorf Band GmbH & Co KG, A-2560 Berndorf, Austria

来源：

CHEMICAL VAPOR DEPOSITION | 2005年 / 11卷 / 11-12期

关键词：

atmospheric-pressure CVD; coatings; plasma-enhanced CVD;

D O I：

10.1002/cvde.200406343

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A new type of DC-powered plasma source (LARGE) was developed and evaluated for continuous plasma-enhanced (PE) CVD under atmospheric pressure. The linear extended emanating plasma sheet was scaled up to various working widths with the result that a half meter range has already been achieved. A CVD reactor was designed for continuous deposition of' non-oxide materials. The reactor operates in a remote atmospheric pressure (AP) PECVD configuration with typical deposition rates of 5-50 nm s(-1) (static) and 0.1-1.0 nm in s(-1) (dynamic). The potential application range of the ArcJet-CVD technology was evaluated by screening studies with various substrates, (stainless steel, glass, silicon wafers) and coating materials (silica, carbon. silicon nitride). In-situ process characterization has been provided by both optical emission and Fourier transform infrared (FTIR) spectroscopy. A range of atomic and molecular intermediates, precursor fragments, and reaction products were identified, leading to the conclusion that a complete conversion of the element-organic precursors into an inorganic layer takes place.

引用

页码：510 / 522

页数：13