Cavity nucleation and delamination during adhesive transfer of a thin viscoelastic film

被引:0
|
作者
McSwain, RL [1 ]
Shull, K [1 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2171770
中图分类号
O59 [应用物理学];
学科分类号
摘要
A model acrylic copolymer system was used to study the processes involved in the transfer of a thin viscoelastic film from a weakly adhesive elastomeric substrate to a more strongly adhesive surface. The film consisted of a layer of acrylic diblock copolymer micelles that was spun cast onto a silicone elastomer from a suspension in butanol. A circular portion of the layer was transferred to a hemispherical glass indenter with which it was brought into contact. The transfer of the film during tensile loading of the indenter began with nucleation of a cavity at the film/elastomer interface and was followed by delamination of the film at this interface. Statistical variations in cavity nucleation for identical loading conditions were quantified by defining a Weibull modulus similar to that used to describe the failure of brittle materials. The average energy release rate required for cavity nucleation at a fixed induction time increased with film thickness in a way that is consistent with the existence of a critical value of the hydrostatic tension at the film/substrate interface. This critical hydrostatic tension was comparable in magnitude to the elastic modulus of the substrate and was about ten times the elastic modulus of the thin film.
引用
收藏
页数:8
相关论文
共 50 条
  • [1] Cavity nucleation and delamination during adhesive transfer of a thin viscoelastic film
    McSwain, Rachel L.
    Shull, Kenneth R.
    Journal of Applied Physics, 2006, 99 (05):
  • [2] Adhesive transfer of thin viscoelastic films
    Shull, KR
    Martin, EF
    Drzal, PL
    Hersam, MC
    Markowitz, AR
    McSwain, RL
    LANGMUIR, 2005, 21 (01) : 178 - 186
  • [3] Undulated blistering during thin film delamination
    Peyla, P
    PHYSICAL REVIEW E, 2000, 62 (02): : R1501 - R1504
  • [4] Coarsening model of cavity nucleation and thin film delamination from single-crystal BaTiO3 with proton implantation
    Hong, Jung-Wuk
    Pyeon, Jae-Ho
    Tedesco, Joseph W.
    Park, Young-Bae
    PHYSICAL REVIEW B, 2007, 75 (21):
  • [5] A three-dimensional viscoelastic analysis of thin film delamination in a peninsula blister specimen
    Roy, Samit
    MECHANICS OF ADVANCED MATERIALS AND STRUCTURES, 2007, 14 (05) : 379 - 390
  • [6] Effects of sliding on interface delamination during thin film buckling
    Ruffini, Antoine
    Durinck, Julien
    Colin, Jerome
    Coupeau, Christophe
    Grilhe, Jean
    SCRIPTA MATERIALIA, 2012, 67 (02) : 157 - 160
  • [7] Delamination of thin film strips
    Yu, HH
    Hutchinson, JW
    THIN SOLID FILMS, 2003, 423 (01) : 54 - 63
  • [8] Thin-Film Optical Grating Transfer Process Using Surface Modulated Film Delamination
    Chaudhuri, Ritesh Ray
    Galang, Eliezer
    Seo, Sang-Woo
    IEEE PHOTONICS TECHNOLOGY LETTERS, 2017, 29 (13) : 1089 - 1092
  • [9] Buckling and Delamination of Ti/Cu/Si Thin Film During Annealing
    Qijing Lin
    Shuming Yang
    Weixuan Jing
    Changsheng Li
    Chenying Wang
    Zhuangde Jiang
    Kely Jiang
    Journal of Electronic Materials, 2014, 43 : 3351 - 3356
  • [10] Buckling and Delamination of Ti/Cu/Si Thin Film During Annealing
    Lin, Qijing
    Yang, Shuming
    Jing, Weixuan
    Li, Changsheng
    Wang, Chenying
    Jiang, Zhuangde
    Jiang, Kely
    JOURNAL OF ELECTRONIC MATERIALS, 2014, 43 (09) : 3351 - 3356