Chemical decomposition of high pressure SF6/N2 (5:95) mixtures under negative DC corona discharges

被引：0
|
作者：
Diaz, J [1 ]
Casanovas, AM [1 ]
Godard, C [1 ]
Casanovas, J [1 ]
机构：
[1] Univ Toulouse 3, CPAT, UMR 5002, F-31062 Toulouse 4, France
来源：
GASEOUS DIELECTRICS IX | 2001年
关键词：
D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：543 / 547
页数：5
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