This paper examines the surface stress associated with the electrochemical desorption of 4-mercaptobenzoic acid (4-MBA) from (111) textured Au in aqueous 0.1 mol L-1 KOH. Self-assenibled monolayers of varying coverage were adsorbed onto the An electrode surface from a 0.1 mol L-1 aqueous KOH solution containing 1 mmol L-1 4-MBA. Adsorption follows Langmuir kinetics and fully formed monolayers, corresponding to 0.29 coverage with respect to the Au surface, are formed in about 120 min. XP spectra confirm the formation of the Au-S bond while FTIR spectra indicate that the 4-MBA is orientated With the carboxylate pointed away from the surface. The one-electron reductive desorption of 4-MBA Occurs at a potential of -0.9 to -1.0 V vs. SSE. depending on coverage, and causes a surface stress change in the tensile direction, indicating that 4-MBA adsorption induces a compressive surface stress to the Au. At short immersion times and low monolayer coverage. the surface stress increases with coverage as the stress response is primarily governed by the Au-S bond density. SAM desorption following longer immersion times produces large stress changes with little corresponding change in SAM coverage. We attribute the additional compressive stress to stabilization of the Au-S bonding regions and the coulombic repulsion between neighboring molecules, both associated with ordering of the 4-MBA on the An surface. Published by Elsevier Ltd.
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Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, JapanUniv Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, Japan
Inaba, Rina
Khademhosseini, Ali
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Harvard Univ, Brigham & Womens Hosp, Sch Med, Ctr Biomed Engn,Dept Med, Boston, MA 02115 USA
MIT, Harvard Mit Div Hlth Sci & Technol, Cambridge, MA 02139 USAUniv Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, Japan
Khademhosseini, Ali
Suzuki, Hiroaki
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Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, JapanUniv Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, Japan
Suzuki, Hiroaki
Fukuda, Junji
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Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, JapanUniv Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050006, Japan
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Univ Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Univ Puerto Rico, Ctr Nanoscale Mat, San Juan, PR 00931 USAUniv Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Sanchez-Pomales, Germarie
Santiago-Rodriguez, Lenibel
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Univ Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Univ Puerto Rico, Ctr Nanoscale Mat, San Juan, PR 00931 USAUniv Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Santiago-Rodriguez, Lenibel
Rivera-Velez, Nelson E.
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Univ Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Univ Puerto Rico, Ctr Nanoscale Mat, San Juan, PR 00931 USAUniv Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Rivera-Velez, Nelson E.
Cabrera, Carlos R.
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Univ Puerto Rico, Dept Chem, San Juan, PR 00931 USA
Univ Puerto Rico, Ctr Nanoscale Mat, San Juan, PR 00931 USAUniv Puerto Rico, Dept Chem, San Juan, PR 00931 USA
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Penn State Univ, Dept Chem, University Pk, PA 16802 USA
Penn State Univ, Dept Phys, University Pk, PA 16802 USAPenn State Univ, Dept Chem, University Pk, PA 16802 USA
Mullen, Thomas J.
Zhang, Pengpeng
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Penn State Univ, Dept Chem, University Pk, PA 16802 USA
Penn State Univ, Dept Phys, University Pk, PA 16802 USAPenn State Univ, Dept Chem, University Pk, PA 16802 USA
Zhang, Pengpeng
Srinivasan, Charan
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Penn State Univ, Dept Chem, University Pk, PA 16802 USA
Penn State Univ, Dept Phys, University Pk, PA 16802 USA
Penn State Univ, Dept Engn Sci & Mech, University Pk, PA 16802 USAPenn State Univ, Dept Chem, University Pk, PA 16802 USA
Srinivasan, Charan
Horn, Mark W.
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Penn State Univ, Dept Engn Sci & Mech, University Pk, PA 16802 USAPenn State Univ, Dept Chem, University Pk, PA 16802 USA
Horn, Mark W.
Weiss, Paul S.
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Penn State Univ, Dept Chem, University Pk, PA 16802 USA
Penn State Univ, Dept Phys, University Pk, PA 16802 USAPenn State Univ, Dept Chem, University Pk, PA 16802 USA