Transfer-free grown bilayer graphene transistors for digital applications

被引:7
|
作者
Wessely, Pia Juliane [1 ]
Wessely, Frank [1 ]
Birinci, Emrah [1 ]
Riedinger, Bernadette [2 ]
Schwalke, Udo [1 ]
机构
[1] Tech Univ Darmstadt, ISTN, Schlossgartenstr 8, D-64289 Darmstadt, Germany
[2] Fraunhofer Inst Werkstoffmech, D-79108 Freiburg, Germany
关键词
Bilayer graphene transistor; Transfer-free growth on insulator; Ultra-high on/off-current ratio; Full silicon CMOS compatible; FEW-LAYER GRAPHENE; HYSTERESIS; TRANSPORT;
D O I
10.1016/j.sse.2012.12.008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We invented a novel method to fabricate graphene transistors on oxidized silicon wafers without the need to transfer graphene layers. By means of catalytic chemical vapor deposition (CCVD) the in situ grown bilayer graphene transistors (BiLGFETs) are realized directly on oxidized silicon substrate, whereby the number of stacked graphene layers is determined by the selected CCVD process parameters, e.g. temperature and gas mixture. BiLGFETs exhibit ultra-high on/off-current ratios of 10(7) at room temperature, exceeding previously reported values by several orders of magnitude. This will allow a simple and low-cost integration of graphene devices for digital nanoelectronic applications in a hybrid silicon CMOS environment for the first time. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:86 / 90
页数:5
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