Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

被引：43
|
作者：
Howard, Heather P. [1 ]
Aiello, Anthony F. [1 ]
Dressler, Justin G. [1 ]
Edwards, Nicholas R. [1 ]
Kessler, Terrance J. [1 ]
Kozlov, Alexei A. [1 ]
Manwaring, Ian R. T. [1 ]
Marshall, Kenneth L. [1 ]
Oliver, James B. [1 ]
Papernov, Semyon [1 ]
Rigatti, Amy L. [1 ]
Roux, Alycia N. [1 ]
Schmid, Ansgar W. [1 ]
Slaney, Nicholas P. [1 ]
Smith, Christopher C. [1 ]
Taylor, Brittany N. [1 ]
Jacobs, Stephen D. [1 ]
机构：
[1] Univ Rochester, Laser Energet Lab, Rochester, NY 14623 USA
来源：
APPLIED OPTICS | 2013年 / 52卷 / 08期
关键词：
FABRICATION;
D O I：
10.1364/AO.52.001682
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A low-temperature chemical cleaning approach has been developed to improve the performance of multilayer dielectric pulse-compressor gratings for use in the OMEGA EP laser system. X-ray photoelectron spectroscopy results guided the selection of targeted cleaning steps to strip specific families of manufacturing residues without damaging the grating's fragile 3D profile. Grating coupons that were cleaned using the optimized method consistently met OMEGA EP requirements on diffraction efficiency and 1054 nm laser-damage resistance at 10 ps. The disappearance of laser-conditioning effects for the highest-damage-threshold samples suggests a transition from a contamination-driven laser-damage mechanism to defect-driven damage for well-cleaned components. (C) 2013 Optical Society of America
引用
收藏
页码：1682 / 1692
页数：11
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