Theoretical and practical aspects of remote temperature measurement in semiconductors manufacturing

被引：0

作者：

Glazman, E ^{[1
]}

Glazman, A ^{[1
]}

Thon, A ^{[1
]}

机构：

[1] 3T True Temp Technol, IL-20179 Misgav, Israel

来源：

IN-LINE CHARACTERIZATION, YIELD RELIABILITY, AND FAILURE ANALYSES IN MICROELECTRONIC MANUFACTURING | 1999年 / 3743卷

关键词：

pyrometry; temperature measurement; semiconductor; non-contact;

D O I：

10.1117/12.346914

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The general principles of operation of passive and active pyrometry methods are considered. The usefulness of ratio, multiratio, approximation, and enhanced emissivity methods to unknown and changing emissivity situations is analyzed. A spectral functional for the emissivity is postulated to give the theoretical limit of accuracy of any passive method. PI novel passive - active method, with accuracy better than 1%, for semiconductor wafer measurement is described and demonstrated through on-line measurement in Rapid Thermal Chemical Vapor Deposition process.

引用

页码：194 / 202

页数：9

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