MEMS switch for wireless communication circuits: Fabrication process and simulation

被引:0
|
作者
Kretly, LC [1 ]
Tavora, A [1 ]
Capovilla, CE [1 ]
机构
[1] Univ Estadual Campinas, DMO, BR-13082970 Campinas, SP, Brazil
关键词
microelectromechanical devices; coplanar waveguides; fabrication; wireless; microwave circuits;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes the process and methodology adopted for the design of a MEMS (Micro Electro Mechanical System) switch in coplanar microstrip lines. The design proposed in this paper is the metallic bridge over a coplanar microstrip line suspended in both sides by two metallic posts. These MEMS switches are designed for operation at S band satisfying the implementation requirements for Bluetooth and WLAN systems giving the possibility of operation in two protocols: IEEE 802.11b up to 11 Mb/s bit rate (commonly named Wi-Fi) and 802.11b up to 54 Mb/s, recently approved with significant rise in data rate when compared to the 802.11b. The S parameters and electromechanical displacement simulations are also presented.
引用
收藏
页码:425 / 427
页数:3
相关论文
共 50 条
  • [1] Fabrication process of nonarcing power MEMS switch
    Yonezawa, Y
    Wakatsuki, N
    Satoh, Y
    Nakatani, T
    Sawa, K
    IEICE TRANSACTIONS ON ELECTRONICS, 2005, E88C (08): : 1629 - 1634
  • [2] Design and Fabrication of RF MEMS Switch by the CMOS Process
    Dai, Ching-Liang
    Peng, Hsuan-Jung
    Liu, Mao-Chen
    Wu, Chyan-Chyi
    Yang, Lung-Jieh
    JOURNAL OF APPLIED SCIENCE AND ENGINEERING, 2005, 8 (03): : 197 - 202
  • [3] Design and Simulation of a Thermally Actuated MEMS Switch for Microwave Circuits
    Zhang, Shumin
    Su, Wansheng
    Zaghloul, Mona
    INTERNATIONAL JOURNAL OF RF AND MICROWAVE COMPUTER-AIDED ENGINEERING, 2009, 19 (04) : 492 - 501
  • [4] RF MEMS SWITCHES AND SWITCH CIRCUITS
    Rebeiz, Gabriel M.
    Muldavin, Jeremy B.
    IEEE MICROWAVE MAGAZINE, 2001, 2 (04) : 59 - 71
  • [5] Develop a novel thermal switch through CMOS MEMS fabrication process
    Lai, You-Liang
    Chou, Lei-Chun
    Juang, Ying-Zong
    Tsai, Hann-Huei
    Huang, Sheng-Chieh
    Chiou, Jin-Chern
    MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY XVI, 2011, 7926
  • [6] Critical process issues in the fabrication of a lateral, self-cleaning, MEMS switch
    Shi, Y
    Kim, SG
    Micro- and Nanosystems-Materials and Devices, 2005, 872 : 463 - 468
  • [7] RE MEMS Tunable Filter: Design, Simulation and Fabrication Process
    Islam, Md. Fokhrul
    Ali, M. A. Mohd.
    Majlis, B. Y.
    Amin, Nowshad
    PROCEEDINGS OF ICECE 2008, VOLS 1 AND 2, 2008, : 247 - 250
  • [8] A MEMS-first fabrication process for integrating CMOS circuits with polysilicon microstructures
    Gianchandani, YB
    Kim, H
    Shinn, M
    Ha, B
    Lee, B
    Najafi, K
    Song, C
    MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS, 1998, : 257 - 262
  • [9] Photolithography process simulation for integrated circuits and microelectromechanical system fabrication
    Key Laboratory of MEMS, Southeast University, Nanjing 210096, China
    Pan Tao Ti Hsueh Pao, 2006, 4 (705-711):
  • [10] Fabrication process improvement of high isolation of RF MEMS switch for 5 G applications
    Bajpai, Anuroop
    Rangra, Kamaljit
    Bansal, Deepak
    SENSORS AND ACTUATORS A-PHYSICAL, 2024, 376