The effect of the interlayer CrN on adhesion characteristics of ta-C films on high-speed steel substrate

被引:1
|
作者
Han Liang [1 ]
Liu De-Lian [1 ]
Chen Xian [2 ]
Zhao Yu-Qing [2 ]
机构
[1] Xidian Univ, Sch Tech Phys, Xian 710071, Peoples R China
[2] Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Xian 710049, Peoples R China
关键词
adhesion; tetrahedral amorphous carbon thin film; X-ray diffraction; Raman spectroscopy; DIAMOND FILMS; DEPOSITION;
D O I
10.7498/aps.62.096802
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
CrN/ta-C composite coating on a high-speed steel substrate is performed by magnetic filtered cathodic arc technique and magnetron sputtering technique. Adheision of ta-C film on the high-speed steel substrate is studied by changing the preparation process of a buffer layer of CrN. The results are as follows. With the increase of nitrogen flow, the buffer layer chromium nitride experiences the phase transition of Cr-Cr2N-CrN; the adhesion of the coating is improved with the increase of nitrogen flow, but when the nitrogen flow exceeds 30 sccm, the adhesion of coating will decline; the preferred orientation and grain structure of chromium nitride are changed by adjusting the substrate bias; the adhesion of the coating is improved with the increases of the bias voltage, but when the bias voltage exceeds 200 V, the the coating adhesion characteristics will be slightly reduced. The abrasion resistance of the test also shows that CrN coating can significantly improve the adhesion of the ta-C film on a substrate of high speed steel, and can also significantly improve the wear characteristics.
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页数:7
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共 12 条
  • [1] A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings
    Barshilia, Harish C.
    Selvakumar, N.
    Deepthi, B.
    Rajam, K. S.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2006, 201 (06): : 2193 - 2201
  • [2] Properties of reactively RF magnetron-sputtered chromium nitride coatings
    Bertrand, G
    Savall, C
    Meunier, C
    [J]. SURFACE & COATINGS TECHNOLOGY, 1997, 96 (2-3): : 323 - 329
  • [3] Chen K.M., 2010, CHIN J VAC SCI TECHN, V30, P662
  • [4] DEPOSITION OF CONTINUOUS AND WELL ADHERING DIAMOND FILMS ON STEEL
    FAYER, A
    GLOZMAN, O
    HOFFMAN, A
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (16) : 2299 - 2301
  • [5] Han L, 2011, ACTA PHYS SIN, V60
  • [6] Structural properties of TiN films grown on stainless steel substrates by a reactive radio-frequency sputtering technique at low temperature
    Kang, TW
    Kim, TW
    [J]. APPLIED SURFACE SCIENCE, 1999, 150 (1-4) : 190 - 194
  • [7] The structure of TiN films deposited by arc ion plating
    Matsue, T
    Hanabusa, T
    Ikeuchi, Y
    [J]. VACUUM, 2002, 66 (3-4) : 435 - 439
  • [8] Paul S W, 1992, J APPL PHYS, V72, P4643
  • [9] Chemical vapour deposition of polycrystalline diamond films on high-speed steel
    Schäfer, L
    Fryda, M
    Stolley, T
    Xiang, L
    Klages, CP
    [J]. SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 447 - 451
  • [10] Sputter-deposited nanocrystalline Cr and CrN coatings on steels
    Seok, JW
    Jadeed, NM
    Lin, RY
    [J]. SURFACE & COATINGS TECHNOLOGY, 2001, 138 (01): : 14 - 22