Modeling of the finite boundary limit of evaporation flux in the contact line region using the surface plasmon resonance imaging

被引:12
|
作者
Kim, Dae Yun [1 ]
Jeong, Chan Ho [1 ]
Lee, Hyung Ju [1 ]
Choi, Chang Kyoung [2 ]
Lee, Seong Hyuk [1 ]
机构
[1] Chung Ang Univ, Sch Mech Engn, Seoul 06974, South Korea
[2] Michigan State Univ, Mech Engn Engn Mech, E Lansing, MI 48824 USA
基金
新加坡国家研究基金会;
关键词
Evaporating thin film (ETF); Diffusion-limited model; Evaporation flux; Surface plasmon resonance imaging (SPRi); Contact line region; Finite boundary limit; Average evaporation flux (AEF); THIN-FILM EVAPORATION; HEAT-TRANSFER; SESSILE DROPLET; PRESSURE; FLOW;
D O I
10.1016/j.icheatmasstransfer.2020.104598
中图分类号
O414.1 [热力学];
学科分类号
摘要
The present study aims to visualize a contact line region including evaporating thin film (ETF) and adsorbed film, and to suggest a new approach for estimating a finite evaporation flux based on a diffusion-limited model. The profiles that cover part of the ETF and the adsorbed film were obtained using the surface plasmon resonance imaging (SPRi) technique. The contact line region film profiles were obtained using an extrapolation method to find the inflection point, as the inward boundary condition. We successfully visualized the ETF at the sub-micron scale that exists near the droplet edge at which the fastest evaporation occurred. The width and thickness of the contact line region were determined. Also, the present study suggested a mathematical expression for the average value of evaporation flux over the area of the contact line region. The results showed that the average evaporation flux (AEF) decreases with an increase of droplet volume; this is because the local evaporation becomes greater as droplets become smaller. Moreover, this approach could be used to estimate the finite evaporation rate that occurs in the contact line region, as well as to impose a finite boundary limit instead of a singular value at the droplet edge.
引用
收藏
页数:7
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