A better hot-carrier-induced degradation monitor for several typical device parameters of pMOSFET's

被引:0
|
作者
Zhang, JC [1 ]
Hao, Y [1 ]
Zhu, ZW [1 ]
机构
[1] Xidian Univ, Inst Microelect, Xian 710071, Peoples R China
来源
SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS | 2001年
关键词
pMOSFET's; hot-carrier-induced; degradation; degradation monitor;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
According to a lot of experimental studies, a better hot-carrier-induced degradation monitor of pMOSFET's is proposed in this paper. Utilizing the new degradation monitor, a new unified model for degradation simulation and lifetime prediction of pMOSFET's is built. Comparison between simulation and measured results shows the new degradation model has a higher accuracy and a wider application range.
引用
收藏
页码:1017 / 1020
页数:4
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