Specular and non-specular x-ray scattering study of SiO2/Si structures

被引：8
|
作者：
Ulyanenkov, A
Omote, K
Matsuo, R
Harada, J
Matsuno, SY
机构：
[1] Rigaku Corp, Xray Res Lab, Akishima, Tokyo 1968666, Japan
[2] Asahi Chem Ind Co Ltd, Analyt & Computat Sci Labs, Shizuoka 4168501, Japan
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1999年 / 32卷 / 12期
关键词：
D O I：
10.1088/0022-3727/32/12/306
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In this investigation we apply the x-ray reflectivity and diffuse scattering measurements to study the interface and surface morphology and bulk properties of SiO2 amorphous films grown on Si substrates. Three samples with different interface and surface roughnesses are analysed. Simultaneous fitting of both specular reflectivity and diffuse scattering curves allows the determination of precise values of surface and interface roughness, film thickness and bulk density of silicon dioxide films. The distorted-wave Born approximation is used for quantitative characterization of diffuse scattering from the samples. The structural parameters obtained by the x-ray method agree with atomic force microscopy results.
引用
收藏
页码：1313 / 1318
页数：6
相关论文
共 50 条
  • [1] Specular and non-specular X-ray reflection from inorganic and organic multilayers
    de Boer, D.K.G.
    Leenaers, A.J.G.
    van der Wielen, M.W.J.
    Stuart, M.A.Cohen
    Fleer, G.J.
    Nieuwhof, R.P.
    Marcelis, A.T.M.
    Sudhoelter, E.J.R.
    Physica B: Condensed Matter, 1998, 248 : 274 - 279
  • [2] Specular and non-specular X-ray reflection from inorganic and organic multilayers
    de Boer, DKG
    Leenaers, AJG
    van der Wielen, MWJ
    Stuart, MAC
    Fleer, GJ
    Nieuwhof, RP
    Marcelis, ATM
    Sudholter, EJR
    PHYSICA B, 1998, 248 : 274 - 279
  • [3] Monte Carlo simulation of non-specular X-ray scattering profiles from multilayered structures
    Gladyszewski, G
    Bruynseraede, Y
    THIN SOLID FILMS, 1996, 275 (1-2) : 184 - 187
  • [4] Combining non-specular X-ray scattering and X-ray absorption spectroscopy for the investigation of buried layers
    Luetzenkirchen-Hecht, Dirk
    Keil, Patrick
    Frahm, Ronald
    SURFACE SCIENCE, 2007, 601 (18) : 4232 - 4235
  • [5] Non-specular X-ray reflection from self-organized ripple structures in Si/Ge multilayers
    Meduna, M
    Holy, V
    Stangl, J
    Hesse, A
    Roch, T
    Bauer, G
    Schmidt, OG
    Eberl, K
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2002, 13 (2-4): : 1003 - 1007
  • [6] Specular and non-specular X-ray reflection from a single-crystal molybdenum mirror surface
    Mizusawa, M
    Sakurai, K
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 199 : 139 - 142
  • [7] Specular X-ray reflectivity study of interfacial SiO2 layer in thermally annealed NiO/Si assembly
    Subarna Mitra
    Suvankar Chakraborty
    Krishnakumar S. R. Menon
    Applied Physics A, 2014, 117 : 1185 - 1190
  • [8] Specular X-ray reflectivity study of interfacial SiO2 layer in thermally annealed NiO/Si assembly
    Mitra, Subarna
    Chakraborty, Suvankar
    Menon, Krishnakumar S. R.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2014, 117 (03): : 1185 - 1190
  • [9] Study of interface correlation in W/C multilayer structure by specular and non-specular grazing incidence X-ray reflectivity measurements
    Biswas, A.
    Haque, S. Maidul
    Tripathi, S.
    De, Rajnarayan
    Rai, S.
    Bhattacharyya, D.
    Sahoo, N. K.
    JOURNAL OF APPLIED PHYSICS, 2015, 118 (16)
  • [10] NON-SPECULAR SCATTERING OF X-RAYS FROM THIN FILMS
    BINDELL, JB
    WAINFAN, N
    JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1970, 3 (DEC1) : 503 - &
12345