Copper Photoelectrodeposition onto Boron Doped Micro and Ultra-nanocrystalline Diamond Electrodes Applied to Nitrate Electroreduction

被引：1
|
作者：
Couto, A. B. [1 ]
Baldan, M. R. [1 ]
Ferreira, N. G. [1 ]
机构：
[1] Inst Nacl Pesquisas Espaciais, BR-12201 Sao Jose Dos Campos, Brazil
来源：
18 SIMPOSIO BRASILEIRO DE ELETROQUIMICA E ELETROANALITICA (XVIII SIBEE) | 2012年 / 43卷 / 01期
关键词：
WASTE-WATER; DEPOSITION; REDUCTION; FILMS;
D O I：
10.1149/1.4704955
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
The influence of the boron doped micro and ultra-nanocrystalline diamond (BDD and BDUND) morphologies in the copper photoelectrodeposition was investigated. Copper particles were deposited in the potentiostat mode and under UV irradiation for both electrodes. For BDD, the copper deposits presented high density and uniformity all over the crystal faces. This behavior may be explained by its semiconductor character that promoted additional photogenerated electrons enhancing the copper reduction reaction. Otherwise, for BDUND the copper particles were randomly located with low density. Concerning the nitrate reduction process, Cu/BDD presented a better response and reproducibility compared to those for the Cu/BDUND electrode.
引用
收藏
页码：177 / 183
页数：7
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