Manganese K- and L3-edge X-ray Absorption Fine Structure Study of Zn1-x MnxTe

被引：3

作者：

Zheng, Wei ^{[1
]}

Jang, Ling-Yun

Lee, Jenn-min

Zheng, Rui Sheng ^{[1
]}

Liu, Chee Wee

Becla, P.

Feng, Zhe Chuan

机构：

[1] Shenzhen Univ, Key Lab Optoelect Devices & Syst, Minist Educ & Guangdong Prov, Inst Optoelect, Shenzhen 518060, Peoples R China

来源：

ADVANCES IN CHEMICAL, MATERIAL AND METALLURGICAL ENGINEERING, PTS 1-5 | 2013年 / 634-638卷

关键词：

ZnMnTe; X-ray absorption fine structure; Extended X-ray absorption fine structure; X-ray absorption near-edge structure; SPECTROSCOPY;

D O I：

10.4028/www.scientific.net/AMR.634-638.2489

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

High-resolution synchrotron radiation x-ray absorption data on Mn K- and L-3-edge for semimagnetic semiconductor Zn1-xMnxTe bulk materials are presented. A detailed analysis of the extended x-ray absorption fine structure by using the IFEFFIT program, and the chemical bonds of Mn-Te are obtained. The x-ray absorption near-edge structure of the Mn K- and L-3-edges are investigated, and the electronic structure of Zn1-xMnxTe with various compositions are studied.

引用

页码：2489 / 2492

页数：4

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