Self-cleaning is a common phenomenon in natural world and has wide applications in people's real life. Here we report a general surface engineering method to fabricate micro/nano hybrid structure on polymer film, which can be applied to other substrates. The modified polymer surface is superhydrophobic with a water contact angle (CA) of 160 +/- 1 degrees and a water sliding angle (SA) of 3 degrees. When bent to two opposite directions, the convex surface and concave surface are still superhydrophobic and exhibit self-cleaning property. Dusts with different sizes can be cleared away from the modified surface by dipping water drops or spraying water mist. The surface engineering method modified surface has ultrahigh robustness. Its perfect multi-scale hierarchical structure and self-cleaning property barely change even after undergoing one hour ultrasonic oscillation. This method is applicable to modify the surfaces of various materials, architectures and devices into self-cleaning surfaces.
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, JapanTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Latthe, Sanjay S.
Sudhagar, P.
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, JapanTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Sudhagar, P.
Devadoss, Anitha
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, JapanTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Devadoss, Anitha
Kumar, A. Madhan
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King Fahd Univ Petr & Minerals, Ctr Res Excellence Corros, Dhahran 31261, Saudi ArabiaTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Kumar, A. Madhan
Liu, Shanhu
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Henan Univ, Coll Chem & Chem Engn, Inst Environm & Analyt Sci, Kaifeng 475001, Peoples R ChinaTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Liu, Shanhu
Terashima, Chiaki
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, JapanTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
Terashima, Chiaki
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Nakata, Kazuya
Fujishima, Akira
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, JapanTokyo Univ Sci, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan
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MIT, Dept Mech Engn, Cambridge, MA 02139 USAMIT, Dept Mech Engn, Cambridge, MA 02139 USA
Kim, Jeong-Gil
Choi, Hyungryul J.
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MIT, Dept Mech Engn, Cambridge, MA 02139 USAMIT, Dept Mech Engn, Cambridge, MA 02139 USA
Choi, Hyungryul J.
Park, Kyoo-Chul
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MIT, Dept Mech Engn, Cambridge, MA 02139 USAMIT, Dept Mech Engn, Cambridge, MA 02139 USA
Park, Kyoo-Chul
Cohen, Robert E.
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MIT, Dept Chem Engn, Cambridge, MA 02139 USAMIT, Dept Mech Engn, Cambridge, MA 02139 USA
Cohen, Robert E.
McKinley, Gareth H.
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MIT, Dept Mech Engn, Cambridge, MA 02139 USAMIT, Dept Mech Engn, Cambridge, MA 02139 USA
McKinley, Gareth H.
Barbastathis, George
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MIT, Dept Mech Engn, Cambridge, MA 02139 USA
Singapore MIT Alliance Res & Technol SMART Ctr Si, Singapore 138602, SingaporeMIT, Dept Mech Engn, Cambridge, MA 02139 USA
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Univ Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, BrazilUniv Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, Brazil
Werle, A. P.
de Souza, M. L.
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Univ Sao Paulo, Inst Quim, BR-05513970 Sao Paulo, SP, BrazilUniv Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, Brazil
de Souza, M. L.
Loh, K.
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Univ Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, BrazilUniv Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, Brazil
Loh, K.
Ando, R.
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Univ Sao Paulo, Inst Quim, BR-05513970 Sao Paulo, SP, BrazilUniv Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, Brazil
Ando, R.
John, V. M.
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Univ Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, BrazilUniv Sao Paulo, Escola Politecn, Dept Construct Engn, BR-05508900 Sao Paulo, SP, Brazil