Evaluation Methods on Adhesion Property between SU-8 Photoresist and Metal Substrate

被引:0
|
作者
Zhang, Xiaolei [1 ]
Du, Liqun [1 ]
Wang, Aoan [1 ]
机构
[1] Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116024, Peoples R China
来源
关键词
pull-off test; scratch test; indentation test; adhesion property; SU-8; photoresist; metal substrate; MECHANICS;
D O I
10.4028/www.scientific.net/KEM.562-565.96
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
During the fabrication process of metal microdevice by SU-8 UV-LIGA technology, due to the poor adhesion strength between SU-8 photoresist and metal substrate it is common for interface separated and bind failure. In this paper pull-off test, scratch test and indentation test were performed to evaluate the adhesion property between SU-8 photoresist and metal substrate, and the feasibility of these three methods was compared. The result shows that the pull-off test fails to evaluate real interface adhesion strength because of the great possibilities of mixed debond appearance which makes the experimental data discrete and inaccurate. The scratch test and the indentation test can efficiently and accurately evaluate the interface adhesion strength between SU-8 photoresist and metal substrate and are demonstrated two preferable methods.
引用
收藏
页码:96 / 101
页数:6
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