The role of carrier gas flow in roll-to-roll AP-PECVD synthesized silica moisture barrier films

被引:9
|
作者
Meshkova, A. S. [1 ,2 ]
Elam, F. M. [1 ,2 ]
Starostin, S. A. [3 ]
van de Sanden, M. C. M. [1 ,2 ]
de Vries, H. W. [1 ]
机构
[1] Dutch Inst Fundamental Energy Res, POB 6336, NL-5600 HH Eindhoven, Netherlands
[2] Eindhoven Univ Technol, POB 513, NL-5600 MB Eindhoven, Netherlands
[3] FUJIFILM Mfg Europe BV, POB 90156, NL-5000 LJ Tilburg, Netherlands
来源
关键词
Atmospheric pressure PECVD; Vertical chemical gradient; Non-uniform deposition rate; Silica barrier film; ATMOSPHERIC-PRESSURE PLASMA; CHEMICAL-CHARACTERIZATION; SIO2-LIKE LAYERS; DEPOSITION; PERMEATION; COATINGS; DISCHARGE; SURFACE; ENCAPSULATION; TRANSPARENT;
D O I
10.1016/j.surfcoat.2018.02.010
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Moisture barrier films are deposited on a polymer foil by roll-to-roll Atmospheric Pressure Plasma Enhanced CVD reactor using a N-2, O-2, TEOS gas mixture. The film microstructure and permeation properties are studied as a function of the carrier gas flow rate with both static and dynamic film transport. The microstructure is analyzed by spatially resolved attenuated total reflectance (ATR)-FTIR and correlated with the vertical density gradient obtained in the dynamic films and the moisture barrier performance. It is shown that by varying the carrier gas flow rate the vertical density gradient, or the network porosity, can be tuned by governing the convective transport inside the reactor consequently densifying the inorganic film at fixed energy cost (i.e. Yasuda parameter) of the process. Moreover, adopting the bilayer architecture allows to achieve the same moisture barrier properties of 2.10(-3) g.m(-2).day(-1) (40 degrees C, 90% RH) at only half the film thickness of a single layer barrier films, which consequently leads to a throughput increase of almost two times.
引用
收藏
页码:20 / 26
页数:7
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