Thermal System Identification (TSI): A Methodology for Post-silicon Characterization and Prediction of the Transient Thermal Field in Multicore Chips

被引:0
|
作者
Cho, Minki [1 ]
Song, William [1 ]
Yalamanchili, Sudhakar [1 ]
Mukhopadhyay, Saibal [1 ]
机构
[1] Georgia Inst Technol, Sch ECE, Atlanta, GA 30332 USA
来源
2012 28TH ANNUAL IEEE SEMICONDUCTOR THERMAL MEASUREMENT AND MANAGEMENT SYMPOSIUM (SEMI-THERM) | 2012年
关键词
Thermal prediction; multi-core; system identification; leakage; process variations;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a methodology for post-silicon thermal prediction to predict the transient thermal field a multicore package for various workload considering chip-to-chip variations in electrical and thermal properties. We use time-frequency duality to represent thermal system in frequency domain as a low-pass filter augmented with a positive feedback path for leakage-temperature interaction. This thermal system is identified through power/thermal measurements on a packaged IC and is used for post-silicon thermal prediction. The effectiveness of the proposed effort is presented considering a 64 core processor in predictive 22nm node and SPEC2006 benchmark applications.
引用
收藏
页码:118 / 124
页数:7
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