Photoluminescence study of InAsSb/InAsSbP heterostructures grown by low-pressure metalorganic chemical vapor deposition

被引:29
|
作者
Kim, S
Erdtmann, M
Wu, D
Kass, E
Yi, H
Diaz, J
Razeghi, M
机构
[1] Center for Quantum Devices, Northwestern University, Evanston
关键词
D O I
10.1063/1.117048
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence has been measured for double- and separate-confinement InAsSb/InAsSbP heterostructures grown by low-pressure metalorganic vapor deposition. A measurement of the integrated luminescence intensity at the temperature range of 77-300 K shows that over a wide range of excitation level (1-5 x 10(2) W/cm(2)) the radiative transitions are the dominant mechanism below T similar to 170 K. Auger recombination coefficient C = C-0 exp(-E(a)/kT) with C-0 approximate to 5 x 10(-27) Cm-6/s and E(a) approximate to 40 meV has been estimated. (C) 1996 American Institute of Physics.
引用
收藏
页码:1614 / 1616
页数:3
相关论文
共 50 条
  • [1] PHOTOLUMINESCENCE STUDIES ON INGAALP LAYERS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
    NARITSUKA, S
    NISHIKAWA, Y
    SUGAWARA, H
    ISHIKAWA, M
    KOKUBUN, Y
    JOURNAL OF ELECTRONIC MATERIALS, 1991, 20 (09) : 687 - 690
  • [2] PHOTOLUMINESCENCE STUDIES IN CUALSE2 EPILAYERS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    CHICHIBU, S
    SHIRAKATA, S
    ISOMURA, S
    HARADA, Y
    UCHIDA, M
    MATSUMOTO, S
    HIGUCHI, H
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (03) : 1225 - 1232
  • [3] IN0.49GA0.51P/GAAS HETEROSTRUCTURES GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    FENG, MS
    LIN, KC
    WU, CC
    CHEN, HD
    SHANG, YC
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) : 672 - 678
  • [4] Silicon delta doping of GaInP grown by low-pressure metalorganic chemical vapor deposition
    Wang, Chien-Jen
    Wu, Janne-Wha
    Chan, Shih-Hsiung
    Chang, Chun-Yen
    Min Sze, Simon
    Feng, Ming-Shiann
    Japanese Journal of Applied Physics, Part 2: Letters, 1995, 34 (9 A):
  • [5] Si delta doped GaN grown by low-pressure metalorganic chemical vapor deposition
    Kim, JH
    Yang, GM
    Choi, SC
    Choi, JY
    Cho, HK
    Lim, KY
    Lee, HJ
    MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH, 1999, 4
  • [6] MAGNESIUM DOPING OF INGAALP GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    WU, CC
    CHANG, CY
    CHEN, PA
    CHEN, HD
    LIN, KC
    CHAN, SH
    APPLIED PHYSICS LETTERS, 1994, 65 (10) : 1269 - 1271
  • [7] EXCITONIC PHOTOLUMINESCENCE IN A CUALSE2 CHALCOPYRITE SEMICONDUCTOR GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    CHICHIBU, S
    MATSUMOTO, S
    SHIRAKATA, S
    ISOMURA, S
    HIGUCHI, H
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (10) : 6446 - 6447
  • [9] CHARACTERISTICS OF CDTE GROWN ON SI BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
    CHOU, RL
    LIN, MS
    CHOU, KS
    APPLIED PHYSICS LETTERS, 1986, 48 (08) : 523 - 525
  • [10] EXPERIMENTAL AND THEORETICAL PHOTOLUMINESCENCE STUDY OF HEAVILY CARBON-DOPED GAAS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION
    KIM, SI
    KIM, MS
    MIN, SK
    LEE, CC
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (10) : 6128 - 6132