Experiment combining ion-beam sputtering and quantitative ICP-OES analysis: angular distributions and total yield of titanium sputtered by 5 keV krypton ions

被引：9

作者：

Fournier, PG

Varenne, O

Baudon, J

Nourtier, A

Govers, TR

机构：

[1] Univ Paris 11, Lab Spect Translat Interact Mol, F-91405 Orsay, France

[2] Univ Paris 13, Phys Lasers Lab, F-93430 Villetaneuse, France

[3] Univ Paris 11, Phys Solides Lab, F-91405 Orsay, France

[4] Aecono Consulting, F-75017 Paris, France

来源：

APPLIED SURFACE SCIENCE | 2004年 / 225卷 / 1-4期

关键词：

ion bombardment; sputtering; angular distribution; sticking; titanium; Mylar (TM);

D O I：

10.1016/j.apsusc.2003.09.042

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A polycrystalline Ti target is submitted to the impact of a 5 keV krypton ion beam at near normal (6 V) incidence. The sputtered material is collected on a Mylar(TM) cylindrical foil surrounding the target. Angularly resolved data on the amount of sputtered Ti are obtained by dissolving the deposits on small squares cut out from the foil and analysing these quantitatively by inductively coupled plasma optical emission spectroscopy (ICP-OES). The angular distributions in two perpendicular directions are rather close to calculated distributions based on a cosine law or obtained from SRIM simulations. A sputtering yield of 2.3 +/- 0.2 is found. The overall sticking coefficient of sputtered Ti on the foil is close to unity. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：135 / 143

页数：9