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Optimization of Grating Coupler over Single-Mode Silicon-on-Insulator Waveguide to Reach < 1 dB Loss through Deep-Learning-Based Inverse Design
被引:1
|作者:
Lin, Chung-Chih
[1
,2
]
Na, Audrey
[2
]
Wu, Yi-Kuei
[3
]
Wang, Likarn
[1
]
Na, Neil
[2
]
机构:
[1] Natl Tsing Hua Univ, Inst Photon Technol, Hsinchu 30013, Taiwan
[2] Artilux Inc, Hsinchu 30288, Taiwan
[3] X Development, Mountain View, CA 94043 USA
来源:
关键词:
SOI;
gating coupler;
single-mode and multi-mode waveguide;
deep learning;
inverse design;
D O I:
10.3390/photonics11030267
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Grating couplers are essential components in silicon photonics that facilitate the coupling of light between waveguides and fibers. Optimization of the grating couplers to reach <1 dB loss when coupling to single-mode fibers (SMFs) has been reported in the literature, but this was based on silicon-on-insulator (SOI) waveguides supporting multi-modes. In this paper, using a deep-learning model combined with an inverse-design process, we achieve <1 dB losses for grating couplers implemented over single-mode SOI waveguides, i.e., a maximum efficiency of 80.5% (-0.94 dB) for gratings constrained with e-beam (EB) lithography critical dimension (CD), and a maximum efficiency of 77.9% (-1.09 dB) for gratings constrained with deep ultraviolet (DUV) lithography CD. To verify these results, we apply covariance matrix adaptation evolution strategy (CMA-ES) and find that while CMA-ES yields slightly better results, i.e., 82.7% (-0.83 dB) and 78.9% (-1.03 dB) considering e-beam and DUV, respectively, the spatial structures generated by CMA-ES are nearly identical to the spatial structures generated by the deep-learning model combined with the inverse-design process. This suggests that our approach can achieve a representative low-loss structure, and may be used to improve the performance of other types of nanophotonic devices in the future.
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页数:11
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