Nanoscale Probing of Electrical Memory Effects in van der Waals Layered PdSe2

被引:0
|
作者
Neumayer, Sabine M. [1 ]
Olunloyo, Olugbenga [1 ,2 ]
Maksymovych, Petro [1 ]
Xiao, Kai [1 ]
机构
[1] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
关键词
PdSe2; 2D material; semiconductor; memcapacitance; memresistance; neuromorphic; scanning microwave impedance microscopy; MICROSCOPY;
D O I
10.1021/acsami.3c14427
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tunable electronic materials that can be switched between different impedance states are fundamental to the hardware elements for neuromorphic computing architectures. This "brain-like" computing paradigm uses highly paralleled and colocated data processing, leading to greatly improved energy efficiency and performance compared to traditional architectures in which data have to be frequently transferred between processor and memory. In this work, we use scanning microwave impedance microscopy for nanoscale electrical and electronic characterization of two-dimensional layered semiconductor PdSe2 to probe neuromorphic properties. The local resolution of tens of nanometers reveals significant differences in electronic behavior between and within PdSe2 nanosheets (NSs). In particular, we detected both n-type and p-type behaviors, although previous reports only point to ambipolar n-type dominating characteristics. Nanoscale capacitance-voltage curves and subsequent calculation of characteristic maps revealed a hysteretic behavior originating from the creation and erasure of Se vacancies as well as the switching of defect charge states. In addition, stacks consisting of two NSs show enhanced resistive and capacitive switching, which is attributed to trapped charge carriers at the interfaces between the stacked NSs. Stacking n- and p-type NSs results in a combined behavior that allows one to tune electrical characteristics. As local inhomogeneities of electrical and electronic behavior can have a significant impact on the overall device performance, the demonstrated nanoscale characterization and analysis will be applicable to a wide range of semiconducting materials.
引用
收藏
页码:3665 / 3673
页数:9
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