共 2 条
High-responsivity InAs quantum well photo-FET integrated on Si substrates for extended-range short-wave infrared photodetector applications
被引:3
|作者:
Ahn, DaeHwan
[1
]
Jeon, Sunghan
[1
,2
]
Suh, Hoyoung
[1
]
Woo, Seungwan
[1
]
Chu, Rafael Jumar
[1
]
Jung, Daehwan
[1
]
Choi, Won Jun
[1
]
Park, Donghee
[1
]
Song, Jin-Dong
[1
]
Choi, Woo-Young
[2
]
Han, Jae-Hoon
[1
]
机构:
[1] Korea Inst Sci & Technol KIST, Ctr Optoelect Mat & Devices, Seoul 02792, South Korea
[2] Yonsei Univ, Dept Elect & Elect Engn, Seoul 03722, South Korea
基金:
新加坡国家研究基金会;
关键词:
CRITICAL-LAYER THICKNESS;
EPITAXIAL-GROWTH;
TRANSISTORS;
TRANSPORT;
FUTURE;
GUIDE;
D O I:
10.1364/PRJ.491498
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Low-intensity light detection necessitates high-responsivity photodetectors. To achieve this, we report In0.53Ga0.47As/InAs/In0.53Ga0.47As quantum well (InAs QW) photo-field-effect-transistors (photo-FETs) inte-grated on a Si substrate using direct wafer bonding. Structure of the InAs QW channel was carefully designed to achieve higher effective mobility and a narrower bandgap compared with a bulk In0.53Ga0.47As, while suppressing the generation of defects due to lattice relaxations. High-performance 2.6 nm InAs QW photo-FETs were success-fully demonstrated with a high on/off ratio of 105 and a high effective mobility of 2370 cm2/(V & BULL; s). The outstand-ing transport characteristics in the InAs QW channel result in an optical responsivity 1.8 times greater than InGaAs photo-FETs and the fast rising/falling times. Further, we experimentally confirmed that the InAs QW photo-FET can detect light in the short-wavelength infrared (SWIR; 1.0-2.5 & mu;m) near 2 & mu;m thanks to bandgap engineering through InAs QW structures. Our result suggests that the InAs QW photo-FET is promising for high-responsivity and extended-range SWIR photodetector applications.& COPY; 2023 Chinese Laser Press
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页码:1465 / 1473
页数:9
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