Two-Dimensional Ferroelasticity and Domain-Wall Flexoelectricity in HgX2 (X = Br or I) Monolayers

被引:0
|
作者
Ding, Xinkai [1 ]
Jia, Yinglu [2 ,3 ]
Gou, Gaoyang [1 ]
机构
[1] Xi An Jiao Tong Univ, Frontier Inst Sci & Technol, State Key Lab Elect Insulat & Power Equipment, Xian 710049, Peoples R China
[2] Univ Nebraska Lincoln, Dept Mech & Mat Engn, Lincoln, NE 68588 USA
[3] Univ Nebraska Lincoln, Dept Chem, Lincoln, NE 68588 USA
基金
美国国家科学基金会;
关键词
TOTAL-ENERGY CALCULATIONS; ELASTIC BAND METHOD; PIEZOELECTRICITY;
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electromechanical phenomena in two-dimensional (2D) materials can be related to sizable electric polarizations and switchable spontaneous ferroelasticity, allowing them to be used as miniaturized electronic and memory devices. Even in a parent centrosymmetric (nonpolar) ferroelastic (FE) material, non-zero polarization can be produced around the FE domain wall, owing to the strain-gradient-induced flexoelectricity. Compared with the negligibly weak flexoelectric effect in bulk compounds, significant electric polarizations can be expected in 2D FE materials that sustain a large elastic strain and a strain gradient. Using first-principles calculations, we predict that spontaneous 2D ferroelasticity and domain-wall flexoelectricity can be simultaneously realized in synthetic HgX2 (X = Br or I) monolayers. The FE phase renders three oriented variants, which form FE domain walls with a large strain gradient and the associated domain-wall flexoelectric polarizations. Our thermodynamic stability analysis and kinetic barrier simulations allow us to manipulate the domain-wall flexoelectricity via applied mechanical stress, thereby enabling future electromechanical applications in nanoelectronics.
引用
收藏
页码:420 / 429
页数:10
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