Stability analysis of a back-gate graphene transistor in air environment附视频

被引:0
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作者
贾昆鹏
杨杰
粟雅娟
聂鹏飞
钟健
梁擎擎
朱慧珑
机构
[1] KeyLaboratoryofMicroelectronicsDevicesandIntegratedTechnology,InstituteofMicroelectronics,ChineseAcademyofSciences
关键词
graphene FET; stability; back-gate; hysteresis;
D O I
暂无
中图分类号
TN325 [晶体管:按材料分];
学科分类号
摘要
<正>The stability of a graphene field effect transistor(GFET) is important to its performance optimization, and study of hysteresis behavior can propose useful suggestions for GFET fabrication and optimization.In this work,a back-gate GFET has been fabricated and characterized,which is compatible with the CMOS process.The stability of a GFET in air has been studied and it is found that a GFET's electrical performance dramatically changes when exposed to air.The hysteresis characteristic of a GFET depending on time has been observed and analyzed systematically.Hysteresis behavior is reversed at room temperature with the Dirac point positive shifted when the GFET is exposed to air after annealing.
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页码:61 / 64
页数:4
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  • [1] Atomic layer deposition of an Al2O3 dielectric on ultrathin graphite by using electron beam irradiation[J]. 蒋然,孟令国,张锡健,Hyung-Suk Jung,Cheol Seong Hwang.半导体学报. 2012(09)