Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

被引：0

作者：

姚凯伦 ^{[1
]}

郑建万 ^{[2
]}

刘祖黎 ^{[3
]}

贾丽慧 ^{[2
]}

机构：

[1] Department of Physics,Huazhong University of Science and Technology,Wuhan 430074,China International Center for Materials Physics,Shenyang 110016,China

[2] Department of Physics,Huazhong University of Science and Technology,Wuhan 430074,China

[3] Department of Physics,Huazhong University of Science and Technology,Wuhan 430074 China State Key Laboratory of Coordination Chemistry,Nanjing University,Nanjing 210093,China

来源：

Plasma Science and Technology | 2007年 / 04期

基金：

中国国家自然科学基金;

关键词：

PECVD; ferrocene; thin films; supply-power; ESCA;

D O I：

暂无

中图分类号：

O484 [薄膜物理学];

学科分类号：

080501 ; 1406 ;

摘要：

In this paper,the characterization of thin films,deposited with the precursor fer-rocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was in-vestigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic ForceMicroscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and SuperconductingQuantum Interference Device(SQUID).It was observed that the film’s layer is homogeneous inthickness and has a dense morphology without cracks.The surface roughness is about 36 nm.Fromthe results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,andcarbon is combined with oxygen in different forms under different supply-powers.The hysteresisloops indicate that the film is of soft magnetism.

引用

页码：436 / 439

页数：4

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