Curvature Compensated CMOS Bandgap Reference with Novel Process Variation Calibration Technique

被引:0
|
作者
Jiancheng Zhang [1 ,2 ]
Mao Ye [1 ,2 ]
Yiqiang Zhao [1 ,2 ]
Gongyuan Zhao [1 ,2 ]
机构
[1] Tianjin Key Laboratory of Imaging and Sensing Microelectronic Technology,Tianjin University
基金
中国国家自然科学基金;
关键词
bandgap; reference voltage; process variation; resistance-trimming; current-calibration; curvature compensation; temperature coefficient;
D O I
10.15918/j.jbit1004-0579.201827.0204
中图分类号
TN432 [场效应型];
学科分类号
摘要
A lowtemperature coefficient( TC) bandgap reference( BGR) with novel process variation calibration technique is proposed in this paper. This proposed calibration technique compensating both TC and output value of BGR achieves fine adjustment step towards the reference voltage,while keeping optimal TC by utilizing large resistance to help layout match. The high-order curvature compensation realized by poly and p-diffusion resistors is introduced into the design to guarantee the temperature characteristic. Implemented in 180 nm technology,the proposed BGR has been simulated to have a power supply rejection ratio( PSRR) of 91 dB@100 Hz. The calibration technique covers output voltage scope of 0. 49 V-0. 56 Vwith TC of 9. 45 × 10;/℃-9. 56 × 10;/℃ over the temperature range of-40 ℃-120 ℃. The designed BGR provides a reference voltage of 500 mV,with measured TC of 10. 1 × 10;/℃.
引用
收藏
页码:182 / 188
页数:7
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