基于EMMI定位的GaN HEMT耐正向可靠性研究

被引:1
|
作者
白霖
林伟杰
林罡
邵国键
任春江
刘柱
机构
[1] 南京电子器件研究所
关键词
氮化镓高电子迁移率晶体管; 微光显微镜; 高温栅偏压; 外延位错; 可靠性;
D O I
10.19623/j.cnki.rpsse.2023.01.008
中图分类号
TN386 [场效应器件];
学科分类号
摘要
GaN HEMT器件在高温栅偏压(HTGB)应力下会出现势垒退化现象,并进一步引发器件在射频工作下的不稳定和失效问题。使用微光显微镜(EMMI)作为主要工具,对器件的HTGB退化问题进行了研究。讨论了不同电偏置条件下器件EMMI发光的分布和形成机理,并对比了器件在HTGB试验前后EMMI发光图像的变化。HTGB后器件在反偏电场下出现明显新增EMMI亮点,对亮点的微区分析定位到栅下有外延位错对应的局部烧毁点。研究表明,延伸至栅下的外延位错会构成漏电通道,对HTGB下的退化和失效存在贡献。
引用
收藏
页码:83 / 88
页数:6
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