MAGNETORESISTANCE EFFECT OBSERVED IN Fe/Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION

被引:0
|
作者
T.He
B.Zhao
Y.Gao
F.Zeng
F.Pan
机构
[1] Laboratory of Advanced Materials
[2] China
[3] Tsinghua University
[4] Department of Materials Science and Engineering
[5] Beijing 100084
关键词
magnetoresistance; multilayer; antiferromagnetic interlayer coupling; nonmagnetic scattering;
D O I
暂无
中图分类号
TG115 [金属的分析试验(金属材料试验)];
学科分类号
080502 ;
摘要
The Fe/Mo multilayers were prepared by electron beam evaporation, the micro structure and magnetic properties of the multilayers were studied by X-ray diffraction, vibrating-sample magnetometer (VSM) et al. The experimental results revealed that the Fe/Mo multilayers in our experimental conditions behaved magnetoresistance effect with a sharp peak on magnetoresistance (MR) ratio curve, and magnetoresistance is easily saturated at low applied magnetic fields. For [Fe(1.5nm)/Mo(1.0nm)]4,2 multilayers, MR ratio could arrive to 0.1%. The antiferromagnetic interlayer coupling could be observed in some films at room temperature. The strength of the antiferromagnetic interlayer coupling J in the films is low because of the low saturation field Hs. The relationship between magnetic properties and micro structure was also discussed in this paper.
引用
收藏
页码:237 / 240
页数:4
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