CALCULATION OF X-RAY EMISSION INTENSITY IN MULTILAYER FILMS USING MONTE CARLO METHOD

被引：0
|
作者：
何延才
陈家光
王心磊
机构：
[1] Shanghai 201900
[2] PRC
[3] Academia Sinica Shanghai 200050
[4] Shanghai Baoshan Steel Works
[5] Shanghai Institute of Ceramics
[6] Academia Sinica
[7] Research Department
来源：
Science China Mathematics | 1989年 / 12期
基金：
中国国家自然科学基金;
关键词：
multilayer films; quantitative X-ray microanalysis; electron scattering; Monte Carlo simulation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Based on the electron scattering model, the theories of electron scattering and the formulae proposed by the authors for calculating generated intensity, absorption and fluorescence correction of X-rays in multilayer films, the ratios of X-ray emitted intensity in multilayer films are calculated with the Monte Carlo simulation. At various voltages, the calculated values for multilayer films Au/Cu/Si and Cr/Ni/Si (substrate: Si) are in good agreement with the experimental results of electron probe microanalysis (EPMA). This work lays foundations for X-ray quantitative microanalysis of multilayer specimens.
引用
收藏
页码：1491 / 1498
页数：8
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