Integration of 256×256 Element Si Microlens Arrays with PtSi IR Detector Array Devices

被引：0
|
作者：
CHEN Si-hai
机构：
来源：
Semiconductor Photonics and Technology | 2001年 / 01期
关键词：
Part etching; Microlens array; Monolithic integration; FPAs;
D O I：
暂无
中图分类号：
TH74 [光学仪器];
学科分类号：
0803 ;
摘要：
Diffractive 11-phase-level Si microlens arrays are fabricated by a special method, i.e. part-etching. The method can increase focal length of diffractive microlens arrays. By using this method, the microlens arrays on the back side of the Si substrate and PtSi IR focal plane arrays(FPAs) on the front side of the same wafer are monolithically integrated together. The IR response characteristics of the integrated devices are improved greatly.
引用
收藏
页码：56 / 59
页数：4
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