Instrumentation and application of the ion beam analysis line of the in situ ion beam system

被引：2
|
作者：
黄志宏 [1 ]
张早娣 [1 ]
王泽松 [1 ]
王浪平 [2 ]
付德君 [1 ]
机构：
[1] Accelerator Laboratory, Key Laboratory of Artificial Micro- and Nano-Materials of Ministry of Education of China,School of Physics and Technology, Wuhan University
[2] State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology
来源：
Nuclear Science and Techniques | 2015年 / 26卷 / 01期
基金：
中国国家自然科学基金;
关键词：
Ion beam analysis; Channeling; Rutherford backscattering; Non-Rutherford elastic backscattering;
D O I：
10.13538/j.1001-8042/nst.26.010202
中图分类号：
TL503 [加速器结构和制造工艺];
学科分类号：
082701 ;
摘要：
An ion beam analysis system was established on a 1.7 MV tandem accelerator, enabling Rutherford backscattering(RBS), elastic recoil detection(ERD), nuclear reaction analysis(NRA) and channeling measurements. The system was tested by performing qualitative and quantitative analysis of Si, Ni/Si, Bi Fe O3:La/Si,Mo C/Mo/Si and Ti BN/Si samples. RBS of a Bi Fe O3:La film was used as system calibration. Tested by ion beam channeling, a Si(100) is of good crystallinity(χmin= 3.01%). For thin film samples, the measured thickness agrees well with simulation results by SIMNRA. In particular, composition of a Mo C/Mo/Si and Ti BN film samples were analyzed by RBS and non-Rutherford elastic backscattering.
引用
收藏
页码：23 / 27
页数：5
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