Enhanced material removal modeling in cylindrical bonnet tool polishing: Incorporating time-dependent pad wear effects

被引:0
|
作者
Teng, Bingbing [1 ]
Jiang, Chen [1 ]
Jiang, Zhenyu [1 ]
Ye, Hui [1 ]
Xu, Shiwei [1 ]
机构
[1] Univ Shanghai Sci & Technol, Shanghai 200093, Peoples R China
基金
中国国家自然科学基金;
关键词
Cylindrical bonnet tool polishing; Enhanced material removal modeling; Time-varying wear of polishing pads; Model validation; Material removal depth; MECHANISMS;
D O I
10.1016/j.precisioneng.2024.09.027
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To enhance the accuracy and stability of the material removal model for cylindrical bonnet tool polishing (CBTP), this study introduces a model incorporating the time-varying wear effect of the polishing pad. Initially, the functional principles of the CBTP method are systematically outlined. An advanced material removal model is then proposed, which accounts for the impact of pad wear on pressure and velocity distributions within the contact area. Experimental methods were employed to explore how pad wear affects the pad surface morphology, polishing quality, and material removal rates. Findings reveal that pad wear considerably influences both the depth of material removal and the quality of the polished surface. Validation experiments demonstrate that the enhanced model is accurate and stable. Including the time-varying factor, the discrepancy between the predicted and experimental values of the polishing spot size was 9.29 %, while the accuracy of the predicted material removal depth reached 90.74 %. Additionally, the removal profiles generated by the improved model closely matched those observed experimentally.
引用
收藏
页码:336 / 343
页数:8
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