The synthesis, characterization, and thermal properties of a titanium (III) amidinate compound and its potential as a single chemical vapor deposition precursor for N/C-doped TiO2 film

被引:0
|
作者
Zhang, Y. [1 ]
Ju, Z. [1 ]
Yao, C. [1 ]
Liu, L. [1 ]
Zhang, X. [1 ]
Xing, J. [1 ]
Cheng, L. [2 ]
机构
[1] Xuchang Univ, Inst Surface Micro & Nano Mat, Coll Chem & Mat Engn, Key Lab Micronano Mat Energy Storage & Convers Hen, Xuchang 461000, Henan, Peoples R China
[2] Hefei ADChem Semitech co Ltd, Hefei 230000, Peoples R China
关键词
Synthesis; Titanium(III) amidinate; CVD; Precursor; N/C-doped TiO2 film; VISIBLE-LIGHT; THIN-FILMS; COMPLEXES; PHOTOCATALYST; PERFORMANCE; COATINGS; ROUTE; ACID; ME;
D O I
10.15251/DJNB.2024.194.1459
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A titanium(III) amidinate compound had been successfully obtained using a salt elimination reaction between TiCl3(3THF) and [Li(iPr-nBuAMD)] in a 65% yield, and the characterization of the compound was conducted using various characterization methods. The reported compound's thermal performances were studied through thermal gravimetric analysis (TGA), and the result indicated that the reported titanium(III) amidinate compound exhibited a suitable volatility, high thermal stability, and sufficient vapor pressure. Furthermore, film material deposit was performed in a CVD reactor under low pressure, and a N/C-doped TiO2 film was successfully deposited.
引用
收藏
页码:1459 / 1469
页数:11
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