Analysis of Stress Development Mechanisms in the Coating/Substrate System

被引:0
|
作者
Volkov, Andrey [1 ]
机构
[1] Natl Aerospce Univ, Kharkiv Aviat Inst, 17 Chkalova St, UA-61070 Kharkiv, Ukraine
关键词
Nanostructures; Thin coatings; Stress; Substrate; Coating properties; THIN-FILMS; INTRINSIC STRESS; SURFACE; GENERATION; CONTACT; ENERGY;
D O I
10.1007/978-3-030-94259-5_8
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
The development of nanotechnologies and the general tendency to increase the areas of use of thin coatings with the simultaneous high cost of high-tech materials makes us pay attention to the possibility of predicting the properties of the obtained coatings. This paper presents an analysis of the mechanisms of stress development of thin coatings for a deeper understanding of the possibilities of modeling the stress state of the obtained coatings with subsequent prediction of the required properties. The magnitude and sign of the internal stress in the coatings depend on many factors related to the conditions and method of coating the substrate, as well as the nature of their growth. Thermal stresses make an important contribution to the overall level of stresses in thin coatings, as well as the development of stresses in current-carrying coatings is significantly influenced by electromigration processes. No less significant contribution to the development of stresses in thin coatings can have the effects associated with the influence of the electromagnetic field: the piezoelectric effect, electro- and magnetostriction.
引用
收藏
页码:78 / 88
页数:11
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