Evidence for double degradation regime in off-state stressed 100 V GaN transistors: From dielectric failure to subthreshold current increase

被引:0
|
作者
Fraccaroli, Riccardo [1 ]
Fregolent, Manuel [1 ]
Boito, Mirco [1 ]
De Santi, Carlo [1 ]
Canato, Eleonora [2 ]
Rossetto, Isabella [2 ]
Castagna, Maria Eloisa [3 ]
Miccoli, Cristina [3 ]
Russo, Alfio [3 ]
Iucolano, Ferdinando [3 ]
Pirani, Alessio [4 ]
Pizzo, Giansalvo [4 ]
Meneghesso, Gaudenzio [1 ]
Zanoni, Enrico [1 ]
Meneghini, Matteo [1 ,5 ]
机构
[1] Univ Padua, Dept Informat Engn, I-35131 Padua, PD, Italy
[2] STMicroelectronics, I-20864 Agrate Brianza, MB, Italy
[3] STMicroelectronics, I-95121 Catania, CT, Italy
[4] STMicroelectronics, I-20007 Cornaredo, MI, Italy
[5] Univ Padua, Dept Phys & Astron, I-35131 Padua, PD, Italy
关键词
Off state stress; Weibull distribution; Dielectric breakdown; Electroluminescence;
D O I
10.1016/j.microrel.2025.115649
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate the existence of two different degradation mechanisms for 100 V GaN transistors submitted to off-state stress. When the devices are stressed in strong pinch-off conditions, a high electric field falls on the dielectric between the source field plate and the channel, and a time dependent dielectric breakdown is observed. On the other hand, for weaker pinch-off, hot electrons trapping at the passivation surface can lower the electric field, leading to longer TTF. A second degradation mode is also observed, consisting in the gradual increase in off-state current, ascribed to positive charge trapping at defects spots.
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页数:4
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