Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering

被引:0
|
作者
Kitagawa, Saiki [1 ,2 ,3 ]
Nakamura, Toshihiro [1 ,2 ]
机构
[1] Kyoto Univ, Grad Sch Human & Environm Studies, Div Mat Sci, Yoshida Nihonmatsu cho,Sakyo ku, Kyoto 6068501, Japan
[2] Kyoto Univ, Inst Liberal Arts & Sci, Dept Chem, Yoshida Nihonmatsu cho,Sakyo ku, Kyoto 6068501, Japan
[3] Japan Soc Promot Sci, Chiyoda Ku, Tokyo 1020083, Japan
来源
基金
日本学术振兴会;
关键词
ROOM-TEMPERATURE FERROMAGNETISM; TRANSPARENT THIN-FILMS; SWANEPOEL METHOD; THICKNESS; IN2O3; SEMICONDUCTOR; MANGANESE; MODEL;
D O I
10.1116/6.0004278
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effects of Sn doping on the structural, electrical, optical, and magnetic properties of epitaxial Mn-doped indium tin oxide (ITO) films were systematically investigated. We deposited epitaxial Mn-doped ITO films with various Sn concentrations using radio frequency magnetron sputtering. The lightly Sn-doped films exhibited the high degree of the crystalline alignment, whereas the heavy Sn doping led to the fluctuations in the crystalline alignment. The carrier concentration and optical bandgap increased with increasing Sn concentration up to about 10 at. % and then decreases at higher Sn concentrations. Room-temperature ferromagnetism was observed across all the films. Furthermore, the magnetization exhibited a strong correlation with the carrier concentration, suggesting that the ferromagnetism in Mn-doped ITO films is likely due to delocalized carrier-mediated interactions. The relatively small magnetization observed in these films may be attributed to ferromagnetic coupling between a limited number of Mn ions present in the films.
引用
收藏
页数:11
相关论文
共 50 条
  • [1] Optical and electrical properties of tin-doped indium oxide transparent conducting films deposited by magnetron sputtering
    Zhong, Z.-Y. (zyzhongzy@163.com), 1600, Chinese Ceramic Society, Baiwanzhuang, Beijing, 100831, China (42):
  • [2] Oxygen Concentration Dependence of the Optical and Electrical Properties of Mn-Doped Tin Oxide Thin Films Deposited on a Polyethylene Terephthalate Substrate
    Cho, Young-Soo
    Jang, Gun-Eik
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2020, 20 (01) : 505 - 509
  • [3] Thickness Dependence of Indium-Tin Oxide Thin Films Deposited by RF Magnetron Sputtering
    Damiani, L. R.
    Mansano, R. D.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2010, 2010, 31 (01): : 117 - 124
  • [4] OPTICAL-ELECTRICAL PROPERTIES AND CORROSION BEHAVIOR OF TANTALUM-DOPED INDIUM TIN OXIDE FILMS DEPOSITED BY MAGNETRON SPUTTERING
    Dong, Xianping
    Zhang, Bo
    Wu, Jiansheng
    THERMEC 2009, PTS 1-4, 2010, 638-642 : 2897 - 2902
  • [5] Electrical and Optical Properties of Indium and Aluminum Doped Zinc Oxide Films Prepared by RF Magnetron Sputtering
    Yan, Luting
    Rath, J. K.
    Schropp, R. E. I.
    ADVANCED ENGINEERING MATERIALS, PTS 1-3, 2011, 194-196 : 2272 - +
  • [6] CHARACTERISTICS OF INDIUM TIN OXIDE-FILMS DEPOSITED BY RF MAGNETRON SPUTTERING
    JOSHI, RN
    SINGH, VP
    MCCLURE, JC
    THIN SOLID FILMS, 1995, 257 (01) : 32 - 35
  • [7] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering
    Deng, WL
    Ohgi, T
    Nejo, H
    Fujita, D
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3364 - 3369
  • [8] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering
    Deng, W.
    Ohgi, T.
    Nejo, H.
    Fujita, D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3364 - 3369
  • [9] The effect of annealing on the structural, electrical, optical and electrochromic properties of indium-tin-oxide films deposited by RF magnetron sputtering technique
    Yuzuak, Gizem Durak
    Coskun, Ozlem Duyar
    OPTIK, 2017, 142 : 320 - 326
  • [10] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    LI ShitaoQIAO XueliangCHEN JianguoJIA FangWU ChangleState Key Laboratory of Plastic Forming Simulation and Die Mould TechnologyHuazhong University of Science and TechnologyWuhan China
    北京科技大学学报, 2006, (08) : 743 - 743