Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering (vol 59, pg 21828, 2024)

被引:0
|
作者
Li, Ziyuan [1 ]
Shen, Longhai [1 ]
Zhou, Ouxiang [1 ]
Zhu, Xiaotian [2 ]
Zhang, Yu [1 ]
Wang, Quhui [1 ]
Qi, Dongli [1 ]
Zhang, Xinglai [1 ]
Han, Mengyao [1 ]
Xu, Junhao [1 ]
Chen, Ye [1 ]
Li, Yuhao [1 ]
机构
[1] Shenyang Ligong Univ, Sch Sci, Shenyang 110159, Peoples R China
[2] Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China
关键词
D O I
10.1007/s10853-024-10575-x
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:2165 / 2167
页数:3
相关论文
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  • [1] Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering
    Li, Ziyuan
    Shen, Longhai
    Zhou, Ouxiang
    Zhu, Xiaotian
    Zhang, Yu
    Wang, Quhui
    Qi, Dongli
    Zhang, Xinglai
    Han, Mengyao
    Xu, Junhao
    Chen, Ye
    Li, Yuhao
    JOURNAL OF MATERIALS SCIENCE, 2024, 59 (47) : 21828 - 21845
  • [2] Mg-doped InXGa1-XN films deposited by reactive rf-magnetron sputtering
    Itoh, Takashi
    Kato, Yoshinori
    Hibino, Syun
    Katayama, Ryuichi
    Ohashi, Fumitaka
    Nonomura, Shuichi
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 12, 2012, 9 (12): : 2411 - 2414