Novel evaluation system for extreme ultraviolet lithography resist in NewSUBARU

被引：0
|
作者：
机构：
[1] [1,Watanabe, Takeo
[2] 1,Kinoshita, Hiroo
[3] 2,Sakaya, Noriyuki
[4] 2,Shoki, Tsutomu
[5] 1,Lee, Seung Yoon
来源：
Watanabe, T. (takeo@lasti.u-hyogo.ac.jp) | 1600年 / Japan Society of Applied Physics卷 / 44期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
14
引用
收藏
相关论文
共 50 条
  • [1] Novel evaluation system for extreme ultraviolet lithography resist in NewSUBARU
    Watanabe, T
    Kinoshita, H
    Sakaya, N
    Shoki, T
    Lee, SY
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (7B): : 5556 - 5559
  • [2] New extreme ultraviolet irradiation and multilayer evaluation system for extreme ultraviolet lithography mirror contamination in the NewSUBARU
    Niibe, Masahito
    Kakutani, Yukinobu
    Terashima, Shigeru
    Takase, Hiromitu
    Gomei, Yoshio
    Matsunari, Shuichi
    Aoki, Takashi
    Murakami, Katsuhiko
    Fukuda, Yasuaki
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5373 - 5377
  • [3] Recent Activities on Extreme Ultraviolet Lithography in NewSUBARU
    Kinoshita, Hiroo
    Watanabe, Takeo
    Harada, Tetsuo
    Nagata, Yutaka
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)
  • [4] Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility
    Watanabe, Takeo
    Harada, Tetsuo
    Yamakawa, Shinji
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2021, 34 (01) : 49 - 53
  • [5] Resist material options for extreme ultraviolet lithography
    Kozawa, Takahiro
    ADVANCED OPTICAL TECHNOLOGIES, 2015, 4 (04) : 311 - 317
  • [6] Resist materials and processes for extreme ultraviolet lithography
    EUVL Infrastructure Development Center, Inc., Tsukuba, Ibaraki 305-8569, Japan
    不详
    Jpn. J. Appl. Phys., 1600, 1
  • [7] Resist Materials and Processes for Extreme Ultraviolet Lithography
    Itani, Toshiro
    Kozawa, Takahiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (01)
  • [8] Resist outgassing characteristics in extreme ultraviolet lithography
    Watanabe, T
    Hamamoto, K
    Kinoshita, H
    Hada, H
    Komano, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6B): : 3713 - 3717
  • [9] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
    Matsuda, Naohiro
    Watanabe, Takeo
    Harada, Tetsuo
    Kinoshita, Hiroo
    Oizumi, Hiroaki
    Itani, Toshiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [10] Mask Effects on Resist Variability in Extreme Ultraviolet Lithography
    Pret, Alessandro Vaglio
    Gronheid, Roel
    Engelen, Jan
    Yan, Pei-Yang
    Leeson, Michael J.
    Younkin, Todd R.
    Garidis, Konstantinos
    Biafore, John
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)
12345