Theoretical approach to liquid-metal field-emission electron sources

被引：0
|
作者：
Dept. of Electron. Sci. and Eng., Kyoto Univ., Yoshida-honmachi, S., Kyoto, Japan [1 ]
机构：
来源：
Appl Surf Sci | / 1卷 / 377-381期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
9
引用
收藏
相关论文
共 50 条
  • [1] Theoretical approach to liquid-metal field-emission electron sources
    Gotoh, Y
    Tsuji, H
    Ishikawa, J
    APPLIED SURFACE SCIENCE, 1999, 146 (1-4) : 377 - 381
  • [2] DYNAMIC BEHAVIOR OF LIQUID-METAL FIELD-EMISSION ION SOURCES
    THOMPSON, S
    PREWETT, PD
    ULTRAMICROSCOPY, 1980, 5 (02) : 237 - 237
  • [3] FIELD-EMISSION FROM A LIQUID-METAL
    SWANSON, LW
    SCHWIND, GA
    ULTRAMICROSCOPY, 1979, 4 (03) : 373 - 374
  • [4] FIELD-EMISSION DEPOSITION - ION ASSISTED DEPOSITION USING LIQUID-METAL SOURCES
    MAHONY, C
    PREWETT, PD
    VACUUM, 1984, 34 (1-2) : 301 - 304
  • [5] THE STEADY-STATE CHARACTERISTICS OF LIQUID-METAL FIELD-EMISSION ION SOURCES
    PREWETT, PD
    JEFFERIES, DK
    ULTRAMICROSCOPY, 1980, 5 (02) : 237 - 237
  • [6] STABLE FIELD-EMISSION OF ELECTRONS FROM LIQUID-METAL
    HATA, K
    OHYA, R
    NISHIGAKI, S
    TAMURA, H
    NODA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (06): : L896 - L898
  • [7] Field-emission processes from a liquid-metal surface
    Fursey, G.N.
    Shirochin, L.A.
    Baskin, L.M.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (02):
  • [8] Field-emission processes from a liquid-metal surface
    Fursey, GN
    Shirochin, LA
    Baskin, LM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (02): : 410 - 421
  • [9] MINIATURIZED LIQUID-METAL FIELD ELECTRON AND ION SOURCES
    MITTERAUER, J
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1989, (99): : 61 - 64
  • [10] MINIATURIZED LIQUID-METAL FIELD ELECTRON AND ION SOURCES
    MITTERAUER, J
    VACUUM MICROELECTRONICS 1989, 1989, 99 : 61 - 64
12345