Electrochemical deposition: A method for the production of artificially structured materials

The potential of electrochemical deposition (ECD) as a production method for artificially structured materials is discussed. Compared with physical vapour deposition (PVD), ECD technology has some definite advantages. Its low cost, industrial applicability and its ability to produce structural features with sizes ranging from nanometres to micrometres have recently created increased interest in this technology for the production of artificially structured materials. The different ECD methods are briefly reviewed and some specific cases of artificially structured coatings produced by ECD, such as epitaxial multilayered material (Cu/Ni), amorphous material in combination with crystalline material (NiPx/NiPy) and alternating hard and ductile materials (NiPx/Sn), will be highlighted. It will be shown that, by controlling the ECD conditions adequately, a wide range of artificially structured materials with respect to their constituent elements and their microstructural morphology may be produced.