HIGH-DIELECTRIC-LOADED FILMS.

被引：0

作者：

Levy, F. ^{[1
]}

机构：

[1] IBM, San Jose, CA, USA, IBM, San Jose, CA, USA

来源：

| 1988年 / 3卷 / 02期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：309 / 326

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[1] HIGH FIELD DIELECTRIC PROPERTIES OF POLYETHYLENE FILMS.
Tokoro, Tetsuro
Shimizu, Hideki
Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi), 1986, 106 (02): : 19 - 30
[2] CVD of high-k dielectric thin films.
Rogers, JW
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U463 - U463
[3] Low dielectric constant CVD fluorocarbon films.
Gleason, KK
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U629 - U629
[4] RADIATION EFFECTS OF DOUBLE LAYER DIELECTRIC FILMS.
Watanabe, Kikuo
Kato, Masataka
Okabe, Takahiro
Nagata, Minoru
IEEE Transactions on Nuclear Science, 1986, NS-33 (06)
[5] COEXTRUDED HIGH BARRIER FILMS.
Dagleish, D.T.
Plastics and rubber international, 1985, 10 (01): : 24 - 25
[6] Dielectric spectra of polarization in conducting polymer thin films.
Texter, J
Savage, DJ
Brady, BK
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 219 : U365 - U365
[7] Characterization of nanoporous low dielectric constant thin films.
Huang, QR
Frank, CW
Mecerreyes, D
Miller, RD
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 221 : U424 - U424
[8] OPTICAL PROPERTIES AND STRUCTURE OF VERY THIN DIELECTRIC FILMS.
Mansurov, G.M.
Pshenitsyn, V.I.
Shchetnev, Yu.F.
Kichenko, E.V.
Zolotarev, V.M.
Journal of applied spectroscopy, 1982, 37 (01): : 844 - 846
[9] Modification of low-dielectric silsesquioxane thin films.
Malek, RI
Heise, A
Volksen, W
Miller, RD
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 217 : U473 - U473
[10] Electrical and Optical Stimulation of Breakdowns in Thin Dielectric Films.
Sapieha, Slawomir
Kryszewski, Marian
Archiwum Elektrotechniki (Warsaw), 1974, 23 (03): : 739 - 747

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