Plasma processing control by a magnetic field crossed to a sheath electric field

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[1] Tanizuka, Noboru
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Tanizuka, Noboru | 1600年
关键词：
Electric Fields - Ions - Magnetic Fields;
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摘要：
This paper deals with a theoretical concept and method of control in plasma processing technologies. Its aim is the selection of ion species and the control of ion kinetic energy bombarding a substrate electrode. The selection and the control are practised within the sheath between the electrode and a DC or rf discharge plamsa by applying an external magnetic field crossed to the sheath electric field.
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