Comprehensive study of the resistivity of copper wires with lateral dimensions of 100 nm and smaller

被引：1
|
作者：
Steinhögl, W. [1 ]
Schindler, G. [1 ]
Steinlesberger, G. [1 ]
Traving, M. [1 ]
Engelhardt, M. [1 ]
机构：
[1] Infineon Technologies, Corporate Research, Otto-Hahn-Ring 6, D-81730 Munich, Germany
来源：
Journal of Applied Physics | 2005年 / 97卷 / 02期
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