PREPARATION OF Si3N4-SiC FILMS BY PLASMA CVD.

被引：0
|
作者：
Kamata, Kiichiro [1 ]
Maeda, Yuuji [1 ]
Yasui, Kanji [1 ]
Moriyama, Minoru [1 ]
机构：
[1] Technological Univ of Nagaoka,, Faculty of Engineering, Nagaoka, Jpn, Technological Univ of Nagaoka, Faculty of Engineering, Nagaoka, Jpn
来源：
Yogyo Kyokai Shi/Journal of the Ceramic Society of Japan | 1986年 / 94卷 / 01期
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摘要：
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页码：12 / 18
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