MONITORING CONTAMINATION IN LIQUIDS FOR SEMICONDUCTOR PROCESSING.

被引：0
|
作者：
Khilnani, Arvind [1 ]
机构：
[1] VLSI Research Inc, San Jose, CA, USA, VLSI Research Inc, San Jose, CA, USA
来源：
Microcontamination | 1986年 / 4卷 / 11期
关键词：
LIQUIDS; -; Contamination;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The semiconductor industry has just begun to focus on the issue of liquid cleanliness. A significant amount of data has emerged on this subject, and preliminary evidence indicates that liquids contribute several orders of magnitude more contamination onto the wafer than do other environmental influences. The author identifies these contamination problems and delineates the liquid chemicals and chemical monitoring techniques used in wafer manufacturing. Also discussed is the ecological impact of liquid contamination and current methods to improve liquid purity.
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页码：26 / 29
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