Chemical mechanical polishing of sapphire substrate

被引：0
|
作者：
Wang, Juan [1 ]
Liu, Yu-Ling [1 ]
Tan, Bai-Mei [1 ]
Li, Wei-Wei [1 ]
Zhou, Jian-Wei [1 ]
Niu, Xin-Huan [1 ]
机构：
[1] Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 2005年 / 04期
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摘要：
8
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页码：65 / 68
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