On the formation of the wavy microrelief on the surface of a semiconductor under actions of high current ion beam

被引：0
|
作者：
Grigor'ev, A.I. [1 ]
Shiryaeva, S.O. [1 ]
Belonozhko, D.F. [1 ]
Golovanov, A.S. [1 ]
机构：
[1] Yaroslavskij GU im. P.G. Demidova, ul. Sovetskaya 14, Yaroslavl', 150000, Russia
来源：
Elektronnaya Obrabotka Materialov | 2000年 / 06期
关键词：
Electric field effects - Electrostatics - Ion beams - Mathematical models - Sputtering - Surface properties;
D O I：
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学科分类号：
摘要：
If to suppose that hydrodynamic flows are negligible the probable mechanism of appearance of an wavy ordered structure on the surface of the semiconductor under action of high energy ionic beam have solely electrostatic nature. An attempt is made to take into account the electric field effect of a high current ion beam. The mathematical model of the process is proposed.
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页码：26 / 30
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