LOCATION OF 125I IMPLANTED IN SILICON AND GERMANIUM.

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作者：
Dezsi, I.
Coussement, R.
Langouche, G.
Van Rossum, M.
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| 1600年 / 76期
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摘要：
GERMANIUM AND ALLOYS - Iodine - MATERIALS - Ion Implantation - Spectroscopy, Mossbauer
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