Laterally-coupled distributed feedback laser fabricated with electron beam lithography and chemically assisted ion beam etching

被引:0
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作者
Tiberio, R.C. [1 ]
Chapman, P.F. [1 ]
Drumheller, J.P. [1 ]
Martin, R.D. [1 ]
Forouhar, S. [1 ]
Lang, R.J. [1 ]
机构
[1] Cornell Univ, Ithaca, United States
基金
美国国家科学基金会;
关键词
Diffraction gratings - Electric currents - Electron beam lithography - Etching - Optical fiber fabrication - Optical waveguides - Performance - Semiconducting gallium arsenide - Semiconductor device structures - Semiconductor growth;
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摘要
The fabrication and optical performance of Laterally-Coupled Distributed Feed-Back (LC-DFB) lasers were investigated. This device differs from a conventional DFB laser in that the grating does not extend inside the laser ridge, rather, gratings adjacent to a single ridge are used to couple to the fringing fields of the active region. This structure allows the entire laser epi-layer structure to be grown in a single step thus eliminating any regrowth steps. A recent design with 1.5 mm cavity length and CAIBE-defined ridges and gratings resulted in pulsed single-mode operation up to 36 mW at 937 nm with as-cleaved facets. The light-current characteristic of this device demonstrated a threshold current of 15 mA and a sidemode suppression ratio of greater than 30 dB. The spectral temperature sensitivity was 0.65 angstrom / °C for this LC-DFB. Also a CW threshold current of 25 mA and an external quantum efficiency of 0.48 mW/mA per facet were measured for a 1 mm cavity length device with anti-reflection coated facets. Fabrication processes and optical characterization are discussed.
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